Optical Process Monitor Optius
You can monitor the status of various plasma processes in real time. 【ULVAC】
The optical process monitor Optius can monitor the status of various plasma processes in real-time by measuring the emission spectrum of the plasma. It is ideal for MFC control in reactive sputtering and endpoint detection in etching. 【Specifications】 ○ Weight: Main unit (TSC): 4.9kg Expansion unit (ESC, 1ch): 1.3kg ○ Power supply: AC100–240V (50/60Hz) ○ Power consumption: 100W (when using 5 channels) ○ Operating environment: Temperature: 10 – 40°C, Humidity: 15 – 80% RH (without condensation) For more details, please contact us or download the catalog.
- Company：アルバック／ULVAC, Inc.
- Price：Other
